Ultra high speed uniform plasma processing system
AssigneeNordson Corporation
InventorsRobert S. Condrashoff, James P. Fazio, James D. Getty, James S. Tyler
Life of this patent
Estimating the term…
Loading patent…
AssigneeNordson Corporation
InventorsRobert S. Condrashoff, James P. Fazio, James D. Getty, James S. Tyler
Estimating the term…
An apparatus for processing a substrate with a plasma. The apparatus includes first and second electrodes positioned with a spaced apart relationship. A separating ring has a vacuum-tight engagement with confronting surfaces of the first electrode and the second electrode to define an evacuatable processing region therebetween. Communicating with the processing region is a process gas port for introducing a process gas to the processing region. The processing region may be evacuated through a vacuum port defined in one of the first and second electrodes to a pressure suitable for exciting a plasma from the process gas in the processing region when the first and second electrodes are powered.
An apparatus for processing a substrate with a plasma, the apparatus comprising:
An apparatus for plasma processing a plurality of substrates, the apparatus comprising:
Dependencies are inferred from the claim text.