Systems incorporating microwave heaters within fluid supply lines of substrate processing chambers and methods for use of such systems

A system, comprising:

• a chamber configured to process one or more wafers for the fabrication of microelectronic devices;
• a reservoir configured to hold a fluid used to process the one or more wafers;
• a supply line coupled between an outlet of the reservoir and an inlet of the chamber;
• a circulation line coupled between the outlet of the reservoir and an inlet of the reservoir, wherein a portion of the circulation line and a portion of the supply line comprise common fluid ducts;
• a microwave heating system arranged among the common fluid ducts;
• a valve arranged along the supply line between the microwave heating system and the inlet of the chamber;
• and
• a controller configured to operate the microwave heating system, wherein the controller comprises a storage medium having program instructions executable by a processor, and wherein the controller operates the microwave heating system at:
• a first power level when the valve is configured to inhibit fluid flow to the inlet of the chamber;
• and
• a second power level higher than the first power level when the valve is configured to allow fluid flow to the inlet of the chamber.