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US 7,843,012 B2Granted
CMOS transistor
AssigneeUnited Microelectronics Corp.
InventorsMing-I Chen, Fang-Mei Chao
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Abstract
The CMOS transistor of the present invention includes deep halo doped regions in the substrate, which can avoid the occurrence of latch-up. In addition, the fabrication of the deep halo doped regions is integrated into the process of making the lightly doped drains or the source/drain doped regions, and therefore no extra mask is required.
Claims4
A CMOS transistor, comprising:
- a substrate comprising a first conductive type MOS device region and a second conductive type MOS device region, the substrate further comprising a second conductive type well disposed in the first conductive type MOS device region, and a first conductive type well disposed in the second conductive type MOS device region;
- a plurality isolation structures disposed on the surface of the substrate;
- a gate structure disposed in the first conductive type MOS device region, and spacers disposed alongside the gate structure;
- two source/drain doped regions disposed in the second conductive type well by both sides of the spacers of the gate structure in the first conductive type MOS device region;
- two lightly doped drains disposed in the second conductive type well by both sides of the gate structure in the first conductive type MOS device region, the two lightly doped drains being corresponding to the spacers;
- and
- two second conductive type deep halo doped regions disposed in the second conductive type well by both sides of the gate structure in the first conductive type MOS device region, wherein each of the deep halo doped regions is disposed corresponding to and directly under one of the source/drain regions and one of the lightly doped drains, wherein no deep halo regions are disposed in the first conductive type well of the second conductive type MOS device region.
4 more elements
Dependencies are inferred from the claim text.