Pixel structure and repairing method thereof

A method of fabricating a pixel structure, comprising:

• forming a gate, a scan line, a common line, and a reserved line on a substrate, wherein the gate is electrically connected with the scan line;
• forming a dielectric layer on the substrate to cover the gate, the scan line, the common line, and the reserved line;
• forming a channel layer on the dielectric layer;
• forming a source, a drain, and a data line on the dielectric layer, wherein the source and the drain cover a portion of the channel layer above two sides of the gate, and the source is electrically connected with the data line, such that the gate, the channel layer, the source, and the drain as an active device;
• forming two repair lines on the dielectric layer, wherein each of the repair lines comprises a first repairing region overlapped with the common line and a second repairing region overlapped with the reserved line;
• and
• forming a pixel electrode on the substrate, so that the pixel electrode is electrically connected with the drain.