Extreme ultra violet light source apparatus

A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:

• a chamber in which extreme ultra violet light is generated;
• a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
• a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma;
• and
• a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
• wherein said laser beam generating unit includes an oscillation laser device which outputs a pulse laser beam, beam dividing means which divides the pulse laser beam outputted from said oscillation laser device into plural optical paths, and plural amplification devices which respectively amplify the divided pulse laser beams.

A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:

• a chamber in which extreme ultra violet light is generated;
• a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
• a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma;
• and
• a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
• wherein said laser beam generating unit includes plural oscillation laser devices which respectively output pulse laser beams having delays different from one another, beam synthesizing means for synthesizing the pulse laser beams respectively outputted from said plural oscillation laser devices, and an amplification device including at least one amplifier which amplifies one of a single pulse laser beam and a pulse train laser beam outputted from said beam synthesizing means.

A laser produced plasma type extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:

• a chamber in which extreme ultra violet light is generated;
• a target supply unit which supplies a liquid or solid metal target to a predetermined position within said chamber;
• a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate one of a single pulse laser beam and a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by said target supply unit to generate plasma;
• and
• a collector mirror which collects the extreme ultra violet light radiated from said plasma and outputs the extreme ultra violet light,
• wherein said laser beam generating unit includes an oscillation laser device which outputs a pulse laser beam, beam dividing means for dividing the pulse laser beam outputted from said oscillation laser device into plural optical paths, beam synthesizing means for synthesizing the pulse laser beams having delays different from one another depending on the respective optical paths, and an amplification device including at least one amplifier which amplifies one of a single pulse laser beam and a pulse train laser beam outputted from said beam synthesizing means.