Method and device for correcting SLM stamp image imperfections
AssigneeMicronic Laser Systems AB
InventorsMartin Olsson, Torbjörn Sandström, Mats Rosling
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Abstract
The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.
Claims27
A method of adjusting intensity values to be generated by a device, the method including:
- rendering the vector pattern data using at least hardware to intensity values;
- determining one or more resampling displacement vectors, wherein a particular resampling displacement vector a vector sum of one or more resampling displacement sub-vectors corresponding to one or more correction parameters;
- resampling the rendered intensity values at offset locations determined from the resampling displacement vectors;
- and;
- forwarding the resampled intensity values towards a device that projects radiation onto a radiation sensitive surface.
Dependencies are inferred from the claim text.