Method of and apparatus for analyzing ions adsorbed on surface of mask
AssigneeSamsung Electronics Co., Ltd.
InventorsDong-Hun Lee, Hae-Young Jeong, Byung-Cheol Cha, Sung-Jae Han
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Abstract
A method of analyzing ions adsorbed on a surface of a mask for pattern formation of a semiconductor device, and an apparatus using the same are disclosed. The ion analyzing method includes: filling a heating container within a main chamber with a predetermined amount of a solvent; immersing a mask in the solvent-filled heating container; raising an internal pressure of the chamber to a predetermined level by supplying gas into the chamber; separating ions from a surface of the mask by heating the solvent within the heating container at a predetermined temperature for a predetermined period; and analyzing the ions by collecting the solvent.
Claims20
A method of analyzing ions adsorbed on a surface of a mask, comprising:
- filling a heating container within a chamber with a predetermined amount of a solvent;
- immersing a mask in the solvent-filled heating container;
- raising an internal pressure of the chamber to a predetermined level;
- separating ions from a surface of the mask by heating the solvent within the heating container to a predetermined temperature for a predetermined period;
- and
- analyzing the ions by collecting the solvent.
A method of manufacturing, comprising:
- adding a solvent to a heating container within a chamber;
- immersing a mask in the solvent within the heating container;
- raising an internal pressure of the chamber;
- separating ions from a surface of the mask by heating the solvent within the heating container;
- and
- manufacturing a semiconductor device using the mask.
Dependencies are inferred from the claim text.