Method to form a photovoltaic cell comprising a thin lamina
AssigneeTwin Creeks Technologies, Inc.
InventorsSrinivasan Sivaram, Aditya Agarwal, S. Brad Herner, Christopher J. Petti
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Abstract
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Claims15
A method for forming a device, the method comprising:
- permanently adhering a first surface of a semiconductor body to a receiver, wherein the receiver is metal;
- and
- cleaving a lamina from the semiconductor body, wherein the lamina comprises the first surface, the first surface remains adhered to the receiver, and the lamina is between 1 and 80 microns thick.
Dependencies are inferred from the claim text.