Beam homogenizer and laser irradiation apparatus
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorTomoaki Moriwaka
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AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorTomoaki Moriwaka
Estimating the term…
The present invention provides a beam homogenizer for homogenizing energy distribution by making the distance between lenses small to shorten the optical path length with the use of an array lens of an optical path shortened type, and a laser irradiation apparatus using the beam homogenizer. The beam homogenizer is equipped with a front side array lens of an optical path shortened type whose second principal point is positioned ahead on a beam incidence side, a back side array lens of an optical path shortened type whose first principal point is positioned behind on a beam emission side, and a condensing lens, wherein the distance between the second principal point of the front side array lens and the first principal point of the back side array lens is equal to the focal length of the back side array lens.
A method of manufacturing a semiconductor device comprising:
A method of manufacturing a semiconductor device comprising:
A method of manufacturing a semiconductor device comprising:
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