Calibration of optical line shortening measurements
AssigneeInfineon Technologies AG
InventorDavid Ziger
Life of this patent
Estimating the term…
Abstract
A system and method of calibrating optical line shortening measurements, and lithography mask for same. The lithography mask comprises a plurality of gratings, with a calibration marker disposed within each grating. The mask is used to pattern resist on a semiconductor wafer for purposes of measuring and calibrating line shortening. The pattern on the wafer is measured and compared to measurements made of the pattern on the mask. The difference gives the amount of line shortening due to flare, and may be used to calibrate line shortening measurements made using optical measurement tools.
Claims16
A lithography mask for calibrating line shortening measurements, the mask comprising:
- a transparent substrate;
- and
- an opaque material disposed on the substrate, the opaque material comprising a test pattern, the test pattern comprising a plurality of gratings arranged in a column or row, each of the gratings comprising a calibration marker disposed therein, wherein each calibration marker of each grating is located at a position between a first end and a second end of each grating, and wherein the position of each calibration marker is different than the position of every other calibration marker of the other gratings in the column or row.
A lithography mask for calibrating line shortening measurements, the mask comprising:
- a transparent substrate;
- a flare sensitive first test pattern disposed on a first region of the transparent substrate, the flare sensitive first test pattern defining a first area having a first and a second dimension and comprising a plurality of parallel gratings arranged in one of rows and columns and each of said plurality of parallel gratings having a length the same as one of said first and second dimensions;
- calibration markers disposed within each of the plurality of parallel gratings, wherein each calibration marker of each grating is located at a position between a first end and a second end of each grating, and wherein the position of each calibration marker is different than the position of every other calibration marker of the other gratings in the column or row;
- and
- a second test pattern disposed on a second region of the transparent substrate, said second test pattern comprising an opaque or attenuated region located proximate a portion of the flare sensitive first test pattern.
A lithography mask, the mask comprising:
- a transparent substrate;
- and
- an opaque material disposed on the substrate, the opaque material comprising a test pattern, the test pattern comprising a plurality of gratings, each grating is an opaque region of a plurality of parallel opaque regions, wherein the plurality of gratings are arranged in a column or row, each grating comprises a line shortening calibration marker disposed therein, and each grating comprises a first end and a second end, wherein the line shortening calibration marker of one of the plurality of gratings is located at a predetermined position between the first end and the second end of each grating, wherein the position of the line shortening calibration marker is different than the position of every other line shortening calibration marker of the other gratings in the column or row.
Dependencies are inferred from the claim text.