System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties

A method of generating a film during a chemical vapor deposition process, the method comprising:

• generating a drive signal, wherein a waveform of the drive signal is a sinusoidal wave;
• using a first series of direct current power pulses to generate a plasma with a first density of radicalized species, wherein a modulation of the first series of direct current power pulses is derived from a first phase of the drive signal;
• disassociating a first portion of a feedstock gas using the radicalized species in the first density of radicalized species, thereby creating a first deposition material;
• depositing at least a portion of the first deposition material on a substrate to form a first layer;
• using a second series of direct current power pulses to create a second density of radicalized species within the plasma, wherein a modulation of the second series of direct current power pulses is derived from a second phase of the drive signal;
• disassociating a second portion of the feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second deposition material;
• and
• depositing the second deposition materials on the first layer.

A method of generating a film during a chemical vapor deposition process, the method comprising:

• generating a pulse control signal;
• providing the pulse control signal to a direct current source;
• generating a first series of power pulses having a first average pulse width, wherein the first series of power pulses is generated by the direct current source during a first phase of the pulse control signal, and wherein a pulse width of each pulse in the first series of power pulses is derived from the amplitude of the pulse control signal during the first phase;
• using the first series of power pulses, generating a first density of radicalized species;
• disassociating a first portion of a feedstock gas using the first density of radicalized species, thereby creating a first plurality of deposition materials;
• depositing the first plurality of deposition materials on a substrate as a first layer;
• generating a second series of power pulses having a second average pulse width, wherein the second average pulse width is different from the first average pulse width, and wherein the second series of power pulses is generated by the direct current source during a second phase of the pulse control signal, and wherein a pulse width of each pulse in the second series of power pulses is derived from the amplitude of the waveform pulse control signal during the second phase;
• using the second series of power pulses, generating a second density of radicalized species;
• disassociating a second portion of a feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second plurality of deposition materials;
• and
• depositing the second plurality of deposition materials on the first layer.