Miniaturised separation column with bonding agent for a gas chromatograph
AssigneeSLS Micro Technology GmbH
InventorUwe Lehmann
Life of this patent
Estimating the term…
Abstract
The invention concerns a separation column in microsystem technology for a gas chromatograph comprising a first substrate, a second substrate which is arranged on the first substrate, wherein a trench structure is provided in at least one substrate and the trench structure is sealed off relative to the environment, a stationary phase applied at least to parts of the trench structure, a gas inlet connected to the trench structure, and a gas outlet connected to the trench structure.
Claims20
A separation column in microsystem technology for a gas chromatograph comprising:
- a first substrate;
- a second substrate which is arranged on the first substrate;
- wherein a trench structure is provided in at least one substrate and the trench structure is sealed off relative to the environment;
- a stationary phase applied at least to parts of the trench structure;
- a gas inlet connected to the trench structure;
- a gas outlet connected to the trench structure;
- and
- a bonding agent which is at least partly arranged between the walls of the trench structure and the stationary phase,
- characterized in that the bonding agent is adapted to effect an at least partial electrostatic passivation of the substrate surface in the region of the trench structure, and
- characterized in that the bonding agent includes a first layer portion and a second layer portion.
A gas chromatograph, comprising:
- a separation column comprising:
- a first substrate;
- a second substrate which is arranged on the first substrate;
- wherein a trench structure is provided in at least one substrate and the trench structure is sealed off relative to the environment;
- a stationary phase applied at least to parts of the trench structure;
- a gas inlet connected to the trench structure;
- a gas outlet connected to the trench structure;
- and
- a bonding agent which is at least partly arranged between the walls of the trench structure and the stationary phase,
- characterized in that the bonding agent is adapted to effect an at least partial electrostatic passivation of the substrate surface in the region of the trench structure, and
- characterized by an electronic control and evaluation unit, and
- characterized in that the electronic control and evaluation unit is arranged on a circuit board on which the first substrate of the separation column is arranged at the same time, and
- characterized by at least one further circuit board which is arranged in parallel spaced relationship with the first circuit board.
A process for the production of a separation column comprising the steps:
- forming a trench structure in a first substrate,
- applying a stationary phase to at least one portion of the trench structure, and
- sealing off the trench structure by applying a second substrate,
- characterized in that a bonding agent effecting an at least partial electrostatic passivation of the substrate surface in the region of the trench structure is applied to at least parts of the trench structure prior to the application of the stationary phase, and
- characterized in that a plasma cleaning or back-sputtering cleaning step is effected between the application of the bonding agent and the application of the stationary phase.
Dependencies are inferred from the claim text.