Method and device for fabricating nano-structure with patterned particle beam
AssigneeInstrument Technology Research Center, National Applied Research Laboratories
InventorsJyh-Shin Chen, Liang-Chiun Chao, Sheng-Yuan Chen, Hsiao-Yu Chou
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Abstract
The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure the method is more simplified and easy to be achieved.
Claims22
A fabrication method for a nano-structure with a patterned particle beam, comprising:
- providing a particle beam;
- providing plural guiding wires having a sleeve covering with a lengthwise direction parallel to the plural guiding wires, wherein vacancies are formed among said plural guiding wires;
- patterning said particle beam by causing said particle beam to pass through said plural vacancies among said plural guiding wires to form a two-dimensional patterned particle beam;
- exposing a substrate under said two-dimensional patterned particle beam;
- and
- providing a precursor gas to react with said two-dimensional patterned particle beam, whereby said nano-structure is formed on said substrate.
A fabrication apparatus for producing a patterned particle beam, comprising:
- a particle source providing a particle beam;
- and
- a patterning device including plural wires having thereamong plural vacancies, and configured for patterning said particle beam by causing said particle beam to pass through said vacancies so as to generate said patterned particle beam, further comprising a sleeve covering said structure of plural wires, wherein said structure of plural wires has a lengthwise direction parallel to that of said sleeve.
A fabrication apparatus for producing a patterned particle beam, comprising:
- a particle source providing a particle beam;
- and
- a patterning device comprising plural pillar-shaped structures and a pattern cover disposed on a surface above said plural pillar-shaped structures, and having plural vacancies among said plural pillar-shaped structures, wherein said particle beam passes through said pattern cover and said plural vacancies, and thereby said patterned particle beam is produced.
A fabrication apparatus for producing a nano-structure with a patterned particle beam, comprising:
- a patterned particle source including:
- a particle source providing a particle beam;
- and
- a patterning device including plural wires having thereamong plural vacancies, and configured for patterning said particle beam by causing said particle beam to pass through said vacancies so as to generate the patterned particle beam, the plural wires further comprise a sleeve covering said plural wires having a lengthwise direction parallel to that of said sleeve;
- a gas source providing a precursor gas;
- and
- a holder carrying and moving a substrate disposed thereon, wherein said nano-structure is formed on said substrate by said patterned particle beam reacting with said precursor gas.
Dependencies are inferred from the claim text.