Method and system for randomizing wafers in a complex process line

A process coordination system, comprising:

• a sampling unit configured to obtain process information from a first and a second process module of a manufacturing environment and to provide, on the basis of said process information, a first ruleset for selecting a first subset of sample substrates from a group of substrates to be processed in said first and second process modules, said first subset of sample substrates to be measured in a first metrology process after processing in said first process module, and to provide a second ruleset for selecting sample substrates to be measured in a second metrology process after processing in said second process module;
• a substrate positioning unit configured to position substrates at specified positions of a transport carrier;
• and
• a coordination unit operatively coupled to said sampling unit and said substrate positioning unit and configured to determine dedicated positions for each substrate of said first subset on the basis of said second ruleset.

A process coordination system, comprising:

• a sampling unit configured to obtain process information from a first and a second process module of a manufacturing environment and to provide, on the basis of said process information, a first ruleset for selecting a first subset of sample substrates from a group of substrates to be processed in said first and second process modules, said first subset of sample substrates to be measured in a first metrology process after processing in said first process module, and to provide a second ruleset for selecting sample substrates to be measured in a second metrology process after processing in said second process module;
• an interface for communicating with at least one process tool of said second process module to control a sequence of substrate processing in said at least one process tool;
• and
• a coordination unit operatively coupled to said sampling unit and said interface and configured to determine a dedicated process sequence at least for each substrate of said first subset on the basis of said second ruleset.