Compound, polymer, and radiation-sensitive composition
AssigneeJsr Corporation
InventorsTomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa, Makoto Shimizu
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AssigneeJsr Corporation
InventorsTomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa, Makoto Shimizu
Estimating the term…
A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
A compound shown by the following formula (1),
A compound shown by the following formula (2),
A compound shown by the following formula (3),
A polymer prepared by polymerizing or copolymerizing at least one compound according to formulae (1), (2) or (3) below, wherein the polymer has a weight average molecular weight determined by gel permeation chromatography of 1,000 to 100,000,
A polymer prepared by copolymerization of at least one compound represented by the following formulae (1), (2), or (3) and a compound represented by the following formula (4), wherein the polymer has a weight average molecular weight determined by gel permeation chromatography of 1,000 to 100,000
Dependencies are inferred from the claim text.