Process and apparatus for producing porous quartz glass base
AssigneeAsahi Glass Company, Limited
InventorsKei Iwata, Takao Uto, Takuya Sakuma
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Abstract
The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.
Claims11
A process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base,
- wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated so that the temperature in the gas discharge pipe is not lower than the temperature of the gas upon entry into the gas discharge pipe.
Dependencies are inferred from the claim text.