Lithographic apparatus and device manufacturing method having liquid evaporation control

A device manufacturing method, comprising:

• at least partially containing liquid, using a barrier member, within a space between a projection system and a radiation-sensitive surface of a substrate;
• projecting a patterned radiation beam through the liquid between the projection system and the radiation-sensitive surface of the substrate, onto a target portion of the substrate;
• and
• reducing cooling of the substrate resulting from evaporation of liquid escaping from the space contained by the barrier member by adding humidified gas through an outlet.

A lithographic apparatus, comprising:

• a substrate table constructed to hold a substrate;
• a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and a radiation-sensitive surface of the substrate with liquid;
• a barrier member arranged to at least partially contain the liquid within the space between the projection system and the substrate;
• and
• a liquid evaporation controller arranged to reduce cooling of the substrate resulting from evaporation of liquid supplied by the liquid supply system to the space escaping from the space contained by the barrier member, the liquid evaporation controller comprising a gas humidity controller configured to interact with a gas source to provide gas with a controlled relative humidity of greater than about 10% adjacent to the liquid when the liquid is in the space between the projection system and the substrate.

A device manufacturing method, comprising:

• at least partially containing liquid, using a barrier member, within a space between a projection system and a radiation-sensitive surface of a substrate;
• projecting a patterned radiation beam through the liquid, in contact with the substrate, onto a target portion of the substrate;
• and
• reducing cooling of the substrate resulting from evaporation of liquid escaping from the space contained by the barrier member by supplying gas with a relative humidity of greater than about 10% adjacent to the liquid.