Film pattern forming method, device, electro-optical apparatus, and electronic appliance

A method for forming a film pattern comprising:

• forming partition walls on a substrate, the partition walls defining a linear first film pattern having a first width and a plurality of second film patterns that each extend perpendicular to the first film pattern in plan view and each have a second width;
• disposing a functional fluid on the substrate between the partition walls that define the first film pattern to form the first film pattern;
• and
• flowing the functional fluid along the substrate from the first film pattern to regions between the partition walls that form the second film pattern,
• wherein the second widths of the second film patterns are less than the first width of the first film pattern;
• the second film patterns are each connected to the first film pattern at a rear edge thereof that is located proximate the first film pattern;
• and
• front edges of the second film patterns are located distal to the first film pattern, and each front edge has a missing part in which a corner of a rectangular contour is missing such that the missing part of each front edge is located distal from the first film pattern.