Chemically amplified resist composition

A chemically amplified resist composition comprising:

• (A) a salt represented by the formula (I):
• wherein R21 represents a C1-C30 hydrocarbon group which may be substituted, and at least one —CH2— in the hydrocarbon group may be substituted by —CO— or —O—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and
• A+ represents at least one organic cation selected from a cation represented by the formula (Ia):
• wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, a cation represented by the formula (Ib):
• wherein P4 and P5 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, and a cation represented by the formula (Ic):
• wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, B represents a sulfur or oxygen atom and m represents 0 or 1,
• (B) a salt represented by the formula (II):
• A′+−E (II)
• wherein A′+ represents at least one organic cation selected from cations represented by the above-mentioned formulae (Ia), (Ib) and (Ic), and
• E− represents an anion represented by the formula (II-1):
• −O3SQ3 (II-1)
• wherein Q3 represents a C1-C10 perfluoroalkyl group, and
• (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.