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US 7,802,376 B2Granted
Apparatus for treating particulate material
OwnerHerbert Hüttlininventor
Life of this patent
Estimating the term…
Abstract
An apparatus for treating particulate material has a process chamber for receiving and treating the material. A bottom is composed of a plurality of overlapping guide plates which are placed one above the other and between which annular slots for process air to pass through are formed. An annular-gap nozzle is arranged centrally in the bottom, the orifice of this annular-gap nozzle being designed in such a way that a planar spray pancake which runs approximately parallel to the bottom plane can be sprayed.
Claims12
An apparatus for treating particulate material, comprising:
- a process chamber which is intended for receiving and treating a material,
- said process chamber having a horizontal bottom which is composed of a plurality of overlapping annular guide plates, which are placed one above the other and between which overlapping annular guide plates annular slots are formed, via which annular slots a process air having an essentially horizontal component motion directed radially outward can be introduced into said process chamber, and
- an annular-gap nozzle being arranged centrally in said bottom, an orifice of said annular-gap nozzle having orifice gaps oriented in such a way that they spray approximately horizontally with a looping angle of 360° such that a planar spray pancake which runs approximately parallel to a bottom plane can be sprayed,
- a central feed for a substance arranged above said annular-gap nozzle, said feed having a discharge orifice arranged above said annular-gap nozzle, wherein said feed and said discharge orifice can be adjusted vertically.
1 more element
Dependencies are inferred from the claim text.