Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks

A method of patterning a substrate comprising first and second fields with a template having a plurality of sections, a first section having a mold and a first subset of alignment forming areas and a plurality of template alignment marks defining a first pattern, and a second section having a second subset of alignment forming areas and a plurality of template alignment marks defining a second pattern wherein the first pattern corresponds to the second pattern, said method comprising:

• positioning a material on said first field of said substrate and a plurality of regions of said substrate, said plurality of regions laying outside of said first and second fields;
• positioning said mold and said substrate such that a desired spatial relationship between said mold and said first field of said substrate is obtained to define a pattern in said material on said first field of said substrate while concurrently defining a plurality of substrate alignment marks with said material in said plurality of regions of said substrate in superimposition with said second section of said template;
• positioning a material on said second field of said substrate;
• and
• positioning said mold and said substrate to obtain a desired spatial relationship between said first subset of template alignment marks and said plurality of substrate alignment marks such that a desired spatial relationship between said mold and said second field of said substrate is obtained to define a pattern in said material on said second field of said substrate.