Substrate supporting/transferring tray
AssigneeCanon Anelva Corporation
InventorsMasami Shibagaki, Yasumi Kurematsu
Life of this patent
Estimating the term…
Loading patent…
AssigneeCanon Anelva Corporation
InventorsMasami Shibagaki, Yasumi Kurematsu
Estimating the term…
To provide a substrate supporting/transferring tray, which can be placed on a substrate supporting part arranged in a treatment chamber in which the heat treatment is performed to a substrate, especially on a substrate supporting part having a built-in heating means for heating the substrate, and on an upper side of which, the substrate is placed. At the time of heat-treating the substrate, the substrate can be more uniformly heated, and when the heat treatment is completed, the tray can be easily removed from the substrate supporting part without waiting for the temperature of the substrate to be reduced, and can transfer the substrate to other parts from the treatment chamber in which the heat treatment is performed. The substrate supporting/transferring tray, which has the disc-shaped substrate supporting part on an upper plane side, and is provided with a cylindrical side wall part extending from a periphery of the disc-shaped substrate supporting part to a lower side, and an annular part extending from a lower end side of the cylindrical side wall part to an outer side in a diameter direction.
A substrate supporting/transferring tray on which a semiconductor substrate may be placed and which tray is adapted to be placed on a substrate supporting member arranged in a treatment chamber in which the heat treatment occurs for the substrate, the substrate supporting/transferring tray comprising:
Dependencies are inferred from the claim text.