# US 7,745,098 B2 · Polymer compound, positive resist composition and method of forming resist pattern

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- Number: US 7,745,098 B2
- Document ID: US7745098B2
- Status: Granted
- Kind: B2
- Application number: 12/198,557
- Filed: 2008-08-26
- Published: 2009-03-05
- Granted: 2010-06-29
- Earliest claimed: 2007-09-04
- Assignees: Tokyo Ohka Kogyo Co., Ltd.
- Inventors: Takahiro Dazai; Takayoshi Mori; Hiroaki Shimizu; Kyoko Ohshita; Komei Hirahara
- Web page: https://patentgrep.com/patent/US7745098B2

## CPC

- H04B 1/123: {using adaptive balancing or compensation means (adaptive filter circuits and algorithms H03H)}
- Y10S 430/111: Polymer of unsaturated acid or ester
- Y10S 430/122: Sulfur compound containing
- Y10S 430/126: Halogen compound containing
- H04B: TRANSMISSION
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group]

## Claims

### Claim 1

A polymer compound, having a structural unit (a0) represented by a general formula (a0-1) shown below, and
a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0):
[wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 1; and R1 represents an acid dissociable, dissolution inhibiting group].

### Claim 2 (depends on 1)

A polymer compound according to claim 1, further having a structural unit (a2) derived from an acrylate ester that contains a lactone-containing cyclic group.

### Claim 3 (depends on 1)

A polymer compound according to claim 1, further having a structural unit (a3) derived from an acrylate ester that contains a polar group-containing aliphatic hydrocarbon group.

### Claim 4

A positive resist composition, comprising a resin component (A) that exhibits increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein
said resin component (A) comprises a polymer compound (A1) having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0):
[wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 1; and R1 represents an acid dissociable, dissolution inhibiting group].

### Claim 5 (depends on 4)

A positive resist composition according to claim 4, wherein said polymer compound (A1) further has a structural unit (a2) derived from an acrylate ester that contains a lactone-containing cyclic group.

### Claim 6 (depends on 4)

A positive resist composition according to claim 4, wherein said polymer compound (A1) further has a structural unit (a3) derived from an acrylate ester that contains a polar group-containing aliphatic hydrocarbon group.

### Claim 7 (depends on 4)

A positive resist composition according to claim 4, further comprising a nitrogen-containing organic compound (D).

### Claim 8 (depends on 4)

A method of forming a resist pattern, comprising: forming a resist film on a substrate using a positive resist composition according to claim 4; conducting exposure of said resist film; and alkali-developing said resist film to form a resist pattern.

### Claim 9 (depends on 4)

A positive resist composition according to claim 4, wherein the acid generator component (B) is a compound represented by General Formula (b-1) or (b-2) shown below:
[wherein R1″ to R3″, R5″ and R6″ each independently represents an aryl group or alkyl group, wherein two of R1″ to R3″ in formula (b-1) may be bonded to each other to form a ring with the sulfur atom; and R4″ represents an alkyl group, halogenated alkyl group, aryl group or alkenyl group that have a substituent represented by R5—O— [wherein, R5 represents a monovalent aromatic organic group, a monovalent aliphatic hydrocarbon group, or a hydroxyalkyl group]; with the proviso that at least one of R1″ to R3″ represents an aryl group, and at least one of R5″ and R6″ represents an aryl group].