Mask defect inspection data generating method, mask defect inspection method and mask production method

A mask defect inspection method comprising:

• extracting inspection area control information showing a plurality of inspection areas except an inspection excluded area having no need of inspection from a pattern inspection region based on photomask inspection data;
• calculating a distance between inspection areas neighboring in a predetermined direction based on the extracted inspection area control information;
• determining whether or not the calculated distance between inspection areas is less than a predetermined distance;
• combining the inspection areas to produce an optimization inspection area when it is determined that the calculated distance between inspection areas is less than a predetermined distance, and producing the inspection areas as an optimization inspection area when it is not determined that the distance is less than the predetermined distance;
• defining the produced optimization inspection area information in inspection layout data for making a reference in a die-to-database defect inspection;
• detecting a pattern formed on the photomask every optimization inspection area using an inspection optical system based on the inspection layout data to acquire sensor data;
• and
• comparing the sensor data with the corresponding reference data to determine whether or not a defect exists.

A mask production method of forming a shield film or half-tone film pattern on a transparent substrate based on photomask design data, comprising:

• extracting inspection area control information showing a plurality of inspection areas except an inspection excluded area having no need of inspection from a pattern inspection region based on photomask inspection data;
• calculating a distance between inspection areas neighboring in a predetermined direction based on the extracted inspection area control information;
• determining whether or not the calculated distance between inspection areas is less than a predetermined distance;
• combining the inspection areas to produce an optimization inspection area when it is determined that the calculated distance between inspection areas is less than a predetermined distance, and producing the inspection areas as an optimization inspection area when it is not determined that the distance is less than the predetermined distance;
• defining the produced optimization inspection area information in inspection layout data for making a reference in a die-to-database defect inspection;
• detecting a pattern formed on the photomask every optimization inspection area using an inspection optical system based on the inspection layout data to acquire sensor data;
• and
• comparing the sensor data with the corresponding reference data to determine whether or not a defect exists.