Exposure device
AssigneeORC Manufacturing Co., Ltd.
InventorsDuk Lee, Jun Ishikawa
Life of this patent
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Abstract
The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.
Claims14
An exposure device for forming predetermined patterns onto an object, comprising:
- an optical source for emitting a UV ray;
- a lighting system for shaping the UV ray into a collimated light beam;
- an aperture member having first and second windows, the aperture member for producing first and second light beams based on the collimated light beam by using the first and second windows, the aperture member being located in the collimated light beam;
- first and second light guiding systems for guiding the first and second light beams, respectively;
- first and second spatial light modulators for spatially modulating the first and second light beams that are guided by the first and second light guiding systems, respectively;
- and
- first and second projection lighting systems for guiding the modulated first and second light beams to the object.
An exposure device for forming predetermined patterns onto an object, comprising:
- first and second optical sources for emitting UV rays;
- first and second lighting systems for shaping the UV rays from the first and second light sources into first and second collimated light beams, respectively;
- a first aperture member having four windows, the first aperture member for splitting the first collimated light beam into four light beams by using the windows, the first aperture member being located in the first collimated light beam;
- a second aperture member having four windows, the second aperture member for splitting the second collimated light beam into four light beams by using the windows, the second aperture member being located in the second collimated light beam;
- first to fourth light guiding systems for guiding the four light beams split by the first aperture member, respectively;
- fifth to eighth light guiding systems for guiding the four light beams split by the second aperture member, respectively;
- first to fourth light spatial light modulators for spatially modulating the four light beams guided by the first to fourth light guiding systems, respectively;
- fifth to eighth light spatial light modulators for spatially modulating the four light beams guided by the fifth to eighth light guiding systems, respectively;
- and
- first to eighth projection lighting systems for guiding the light beams modulated by the first to eighth spatial light modulators to the object, respectively.
Dependencies are inferred from the claim text.