Lithography system and lithography method using the same
AssigneeNuFlare Technology, Inc.
InventorHideo Inoue
Life of this patent
Estimating the term…
Abstract
The window-frame judgment unit judges that a section to be drawn has entered a window-frame area according to the main deflector data and the stage position information to output judgment signal. The main deflector calculator receives the main deflector data and calculates calculation data for driving a driving unit based on the main deflector data. The transfer controller detects output of the judgment signal and completion of drawing in the section under drawing to receive a transfer of the calculation data from the main deflector calculator and transfer the calculation data to the driving unit.
Claims19
A lithography system that deflects a beam to draw a desired pattern on a sample, the system comprising:
- a beam optical system that includes a deflector to deflect the beam;
- a driving unit that drives the deflector;
- a data generation circuit programmed or configured to generate main deflector data to deflect the beam to one of a plurality of sections, the sections being made by dividing patterning data representing a pattern to be drawn;
- a stage enabled to mount the sample;
- a position detector to detect a position of the stage to obtain stage position information;
- a window-frame judgment unit programmed or configured to judge that the section to be drawn has entered a window-frame area where the beam may be scanned according to the main deflector data and the stage position information to output a judgment signal;
- a main deflector calculator programmed or configured to receive the main deflector data as input in parallel with the window-frame judgment unit and to calculate calculation data for driving the driving unit based on the main deflector data in parallel with the judgment in the window-frame judgment unit;
- and
- a transfer controller programmed or configured to detect output of the judgment signal and completion of drawing in the section under drawing, to receive a transfer of the calculation data from the main deflector calculator, and to transfer the calculation data to the driving unit.
A drawing method in a lithography system comprising a beam optical system that includes a deflector to deflect the beam, a driving unit that drives the deflector, and a stage enabled to mount the sample, comprising:
- generating main deflector data for deflecting the beam to one of a plurality of sections, the sections being made by dividing patterning data representing a pattern to be drawn;
- detecting a position of the stage to obtain stage position information;
- judging that the section to be drawn has entered a window-frame area where the beam may be scanned according to the main deflector data and the stage position information to output a judgment signal;
- calculating calculation data for driving the driving unit based on the main deflector data in parallel with the step of outputting the judgment signal;
- and
- detecting that the judgment signal has been output and drawing in the section under drawing has been completed to transfer the calculation data to the driving unit.
A lithography system that deflects a beam to draw a desired pattern on a sample, the system comprising:
- a beam optical system that includes a deflector to deflect the beam;
- a driving unit that drives the deflector;
- a data generation means for generating main deflector data for deflecting the beam to one of a plurality of sections, the sections being made by dividing patterning data representing a pattern to be drawn;
- a stage enabled to mount the sample;
- a position detector circuit detecting a position of the stage to obtain stage position information;
- a window-frame judgment means for judging that the section to be drawn has entered a window-frame area where the beam may be scanned according to the main deflector data and the stage position information to output a judgment signal;
- a main deflector calculator means for receiving the main deflector data as input in parallel with the window-frame judgment unit and for calculating calculation data for driving the driving unit based on the main deflector data in parallel with the judgment in the window-frame judgment means;
- and
- a transfer controller means for detecting output of the judgment signal and completion of drawing in the section under drawing to receive a transfer of the calculation data from the main deflector calculator and for transferring the calculation data to the driving unit.
Dependencies are inferred from the claim text.