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US 7,741,004 B2Granted
Method of forming pattern by utilizing coatable inorganic material
AssigneeIndustrial Technology Research Institute
InventorsChin-Tien Yang, Ming-Fang Hsu, Sheng-Li Chang, Tzuan-Ren Jeng
Life of this patent
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Abstract
A coatable inorganic material is provided, which is suitable for being coated on a substrate in the form of sol-gel solution and then being directly written with thermochemical mode by using a laser beam. The coatable inorganic material is an oxide, in which the chemical element constitution is more than one element selected from Te, Al, Zr, and Ti.
Claims12
A method of forming a pattern, comprising:
- providing a substrate;
- coating on the substrate to form a layer of a coatable inorganic material, wherein the coatable inorganic material comprises an oxide, in which the chemical element constitution is more than one element selected from Te, Al, Zr, and Ti;
- and
- utilizing a laser beam through a thermochemical relief reaction to perform direct write on the coatable inorganic material, so as to directly form a relief pattern without a developing and etching process.
1 more element
Dependencies are inferred from the claim text.