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US 7,740,767 B2Granted
Method and apparatus for manufacturing patterned media
AssigneeKabushiki Kaisha Toshiba
InventorsAkira Kikitsu, Yoshiyuki Kamata, Satoshi Shirotori, Masatoshi Sakurai
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Abstract
According to one embodiment, a method for manufacturing a patterned media includes forming patterns of a magnetic layer having protrusions and recesses corresponding to tracks, servo zones or data zones on a substrate having a center hole, and spraying gas flow produced by diffusing a liquid gas toward the center hole of the substrate before or after forming the patterns of the magnetic layer.
Claims17
A method for manufacturing a patterned media, comprising:
- forming a patterned magnetic layer or a magnetic layer having protrusions on a first substrate at a position corresponding to tracks, servo zones or data zones, the first substrate being provided with a center hole, and forming the patterned magnetic layer or the magnetic layer having the protrusions including:
- partially etching a second substrate having a first surface and provided with a center hole to obtain as the first substrate a substrate having protrusions on the first surface and then depositing a first magnetic layer on the first surface to obtain the magnetic layer having the protrusions, or
- providing a substrate having a second surface as the first substrate, depositing a second magnetic layer on the second surface, and partially etching the second magnetic layer to obtain the patterned magnetic layer;
- and
- applying a jet of a material in solid state or a jet of a liquefied gas material to an inner peripheral portion of the first substrate in a process chamber after partially etching the second substrate or after partially etching the second magnetic layer such that the jet of the material in solid state or the jet of the liquefied gas material removes residue from the first substrate or the second magnetic layer at a position of the inner peripheral portion of the first substrate, the jet of the material in solid state being produced by injecting a liquefied gas material into the process chamber to reduce a pressure of the liquefied gas material, and the residue to be removed being produced by partially etching the second substrate or by partially etching the second magnetic layer.
2 more elements
Dependencies are inferred from the claim text.