Tantalum sputtering target and method for preparation thereof
AssigneeNippon Mining & Metals Co., Ltd.
InventorKunihiro Oda
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Abstract
Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, including the steps of forging and recrystallization annealing, and thereafter rolling, a tantalum ingot or billet having been subject to melting and casting, and forming a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target. As a result, evenness (uniformity) of the film is enhanced, and quality of the sputter deposition is improved.
Claims9
A sputtering target comprising a tantalum sputtering target having a target thickness, a peripheral edge, and a crystal structure in which the (222) orientation is preferential at a center portion of the target from a position of 30% of the target thickness toward a center face of the target, said crystal structure in which the (222) orientation is preferential does not exist at said peripheral edge.
A sputtering target comprising a tantalum sputtering target having a target thickness, a peripheral edge, and a crystal structure in which the (222) orientation is preferential at a center portion of the target from a position of 20% of the target thickness toward a center face of the target, said crystal structure in which the (222) orientation is preferential does not exist at said peripheral edge.
A sputtering target comprising a tantalum sputtering target having a target thickness, a peripheral edge, and a crystal structure in which the (222) orientation is preferential at a center portion of the target from a position of 10% of the target thickness toward a center face of the target, said crystal structure in which the (222) orientation is preferential does not exist at said peripheral edge.
Dependencies are inferred from the claim text.