Developing apparatus and developing method
AssigneesTokyo Electron Limited, Octec Inc.
InventorsTakanori Nishi, Takahiro Kitano, Katsuya Okumura
Life of this patent
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Abstract
A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle.
Claims8
A developing apparatus which develops a resist film on a substrate after exposure, said apparatus comprising:
- a substrate holder to hold the substrate;
- a heating means which is provided in the substrate holder, and heats the substrate on the substrate holder to a predetermined temperature for processing the resist film by PEB;
- a cooling means for cooling the substrate heated by the heating means on the substrate holder;
- a developing solution supply means for supplying a developing solution to the substrate cooled by the cooling means on the substrate holder;
- a surface reforming liquid supply means for supplying a surface reforming liquid to the substrate on the substrate holder to accelerate reaction of the resist film in the PEB process;
- and
- a control means for controlling the heating means, the cooling means, the developing solution supply means, and the surface reforming liquid supply means.
A developing apparatus which develops a resist film on a substrate after exposure, said apparatus comprising:
- a substrate holder to hold the substrate;
- a heating means which is provided in the substrate holder, and heats the substrate on the substrate holder to a predetermined temperature for processing the resist film by PEB;
- a Peltier element in the substrate holder to cool the substrate heated by the heating means on the substrate holder;
- a developing solution supply means for supplying a developing solution to the substrate cooled by the Peltier element on the substrate holder;
- and
- a surface reforming liquid supply means for supplying a surface reforming liquid to the substrate on the substrate holder to accelerate reaction of the resist film in the PEB process;
- a control means for controlling the heating means, the Peltier element, the developing solution supply means, and the surface reforming liquid supply means.
Dependencies are inferred from the claim text.