System and process for calibrating pyrometers in thermal processing chambers
AssigneeMattson Technology, Inc.
InventorPaul Janis Timans
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Abstract
A method and system for calibrating temperature measurement devices, such as pyrometers, in thermal processing chambers are disclosed. According to the present invention, the system includes a calibrating light source that emits light energy onto a substrate contained in the thermal processing chamber. A light detector then detects the amount of light that is being transmitted through the substrate. The amount of detected light energy is then used to calibrate a temperature measurement device that is used in the system.
Claims12
A calibration wafer intended to be used for calibrating temperature measurement devices in thermal processing chambers, the calibration wafer comprising:
- a wafer having a diameter of at least 200 mm, the wafer comprising a first region and a second region, the thickness of the wafer at the first region being less than about 150 microns and, the first region having a temperature dependent optical transmission characteristic so that the wafer can be use for calibrating temperature measurement devices;
- wherein the thickness of the wafer at the first region is less than the thickness of the wafer at the second region;
- wherein at a calibration temperature, the first region is transparent to infrared radiation and the second region is opaque to infrared radiation.
Dependencies are inferred from the claim text.