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US 7,733,625 B2Granted
Substrate holding system and exposure apparatus using the same
AssigneeCanon Kabushiki Kaisha
InventorsAtsushi Ito, Keiji Emoto
Life of this patent
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Abstract
A substrate holding system including a substrate attracting device, an exhausting device, and a control device to operate the exhausting device so that a pressure around the substrate and a pressure at an interval between the substrate and the substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.
Claims5
A substrate holding system comprising:
- a substrate attracting device;
- a supporting table configured to support said substrate attracting device at three points;
- an exhausting device;
- and
- a control device configured to operate said exhausting device, so that a pressure around the substrate and a pressure at an interval between the substrate and said substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.
2 more elements
Dependencies are inferred from the claim text.