Defect inspection apparatus and method
AssigneeHoriba, Ltd.
InventorsToyoki Kanzaki, Tatsuo Ohka, Teruhiko Ikeda
Life of this patent
Estimating the term…
Abstract
The defect inspection apparatus and method for determining an acceptable condition of a reticle/mask member with a pattern area to be developed on a semiconductor device includes determining a non-pattern area and designating an inspection target area within a non-pattern area. Light is scanned across the inspection target area and detected to provide representative signals. The representative signals are processed to define the status of foreign matter including size and location and further compared with predetermined values to determine the acceptability of the mask for continued production purposes.
Claims10
A defect inspection apparatus, comprising:
- a light source for illuminating inspection light on a sample with an inspection target plane that has a pattern area in which a pattern is formed and a non-pattern area in which a pattern is not formed, and has a frame member for supporting a protective coat for preventing an adhesion of foreign matters on the pattern area and the non-pattern area;
- means for defining an inspection target area on the inspection target plane;
- a light scanning part for scanning the inspection light on the inspection target plane;
- and
- a photodetector that, when the light scanning part scans the inspection light on the inspection target plane, detects light diffracted and/or scattered by the inspection target plane and provides output signals;
- wherein the inspection target area is set in the non-pattern area for defining the output signals to be processed to monitor a condition of the sample.
A defect inspection apparatus, comprising:
- a light source for illuminating inspection light on an inspection target plane that has a pattern area in which a pattern is formed and a non-pattern area in which a pattern is not formed, and has a frame member for supporting a protective coat for preventing an adhesion of foreign matters on the pattern area being provided in the non-pattern area;
- a light scanning part for scanning the inspection light on the inspection target plane;
- and
- a photodetector that, when the light scanning part scans the inspection light on the inspection target plane, detects light diffracted and/or scattered by the inspection target plane;
- wherein the inspection target area is set in the non-pattern area.
Dependencies are inferred from the claim text.