Lithographic apparatus and device manufacturing method

A lithographic projection apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid being water or an aqueous solution having the following properties (a) to (c) in the space for exposure:
• (a) a particle content of no more than 2 particles having a dimension of 50 nm or greater per ml of liquid;
• (b) a dissolved oxygen concentration of 15 ppb or less;
• and
• (c) a silica content of 500 ppt or less.

A lithographic projection apparatus, comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid being water or an aqueous solution having the following properties (a) to (c) in the space for exposure:
• (a) a particle content of no more than 2 particles having a dimension of 50 nm or greater per ml of liquid;
• (b) a dissolved oxygen concentration of 15 ppb or less;
• and
• (c) a silica content of 500 ppt or less;
• and
• a measurement device configured to measure a property of the liquid indicative of contamination.

A lithographic projection apparatus, comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid being water or an aqueous solution having the following properties (a) to (c) in the space for exposure:
• (a) a particle content of no more than 2 particles having a dimension of 50 nm or greater per ml of liquid;
• (b) a dissolved oxygen concentration of 15 ppb of less;
• and
• (c) a silica content of 500 ppt or less;
• a liquid purifier configured to purify the liquid;
• a gas content reduction device configured to reduce the gas content of the liquid;
• and
• a measurement device configured to measure the presence of particles in the liquid.