Self-poling piezoelectric MEMs device
AssigneeFreescale Semiconductor, Inc.
InventorLianjun Liu
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Abstract
A self-poling piezoelectric based MEMS device is configured for piezoelectric actuation in response to application of a device operating voltage. The MEMS device comprises a beam, a first electrode disposed on the beam, a layer of piezoelectric material having a self-poling thickness disposed overlying a portion of the first electrode, and a second electrode overlying the layer of piezoelectric material. The layer of piezoelectric material is self-poled in response to application of the device operating voltage across the first and second electrodes. In addition, the self-poled piezoelectric material has a poling direction established according to a polarity orientation of the device operating voltage as applied across the first and second electrodes.
Claims20
A self-poling piezoelectric based MEMS device configured for piezoelectric actuation in response to application of a device operating voltage, the MEMS device comprising:
- a beam;
- a first electrode disposed on the beam;
- a layer of piezoelectric material having a self-poling thickness disposed overlying a portion of the first electrode;
- and
- a second electrode overlying the layer of piezoelectric material, wherein the layer of piezoelectric material is self-poled in response to application of the device operating voltage across the first and second electrodes, the self-poled piezoelectric material further having a poling direction established according to a polarity orientation of the device operating voltage as applied across the first and second electrodes.
A self-poling piezoelectric based MEMS device configured for piezoelectric actuation in response to application of a device operating voltage, the MEMS device comprising:
- a beam;
- a first electrode disposed on the beam;
- a layer of piezoelectric material having a self-poling thickness disposed overlying a portion of the first electrode, wherein the self-poling thickness equals a thickness determined as a function of the device operating voltage divided by a poling field strength of greater than or equal to 100 KV/cm;
- a second electrode overlying the layer of piezoelectric material, wherein the layer of piezoelectric material is self-poled in response to application of the device operating voltage across the first and second electrodes, the self-poled piezoelectric material further having a poling direction established according to a polarity orientation of the device operating voltage as applied across the first and second electrodes, wherein the device operating voltage comprises a voltage in the range of less than or equal to five volts;
- a first conductor coupled to the beam;
- and
- a second conductor disposed proximate the first conductor, wherein further responsive to application of the device operating voltage across the first and second electrodes, the piezoelectric material layer actuates and the first conductor is moved from a position of non-physical contact into physical contact with the second conductor in response to the actuation of the piezoelectric material.
A method of implementing a self-poling in a piezoelectric based MEMS device that is configured for piezoelectric actuation in response to application of a device operating voltage, the method comprising:
- disposing a first electrode on a beam;
- disposing a layer of piezoelectric material overlying a portion of the first electrode, the layer of piezoelectric material having a self-poling thickness;
- and
- disposing a second electrode overlying the layer of piezoelectric material, wherein self-poling of the layer of piezoelectric material occurs in response to application of the device operating voltage across the first and second electrodes, the self-poled piezoelectric material further having a poling direction established according to a polarity orientation of the device operating voltage as applied across the first and second electrodes.
Dependencies are inferred from the claim text.