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US 7,732,746 B2Granted
Image sensor and method of fabricating the same
AssigneeDongbu Electronics Co., Ltd.
InventorJoon Hwang
Life of this patent
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Abstract
Provided is an image sensor including an overcoating layer and at least two micro lenses formed on the overcoating layer. The image sensor is characterized in that the overcoating layer positioned below a clearance between the micro lenses is etched such that curved surfaces of the micro lenses extend to the etched overcoating layer, and a contamination in the bonding pad can be prevented.
Claims3
An image sensor comprising:
- an overcoating layer;
- and
- at least two micro lenses formed on the overcoating layer using a flow process,
- wherein the overcoating layer positioned below a clearance between the micro lenses is etched such that curved surfaces of the micro lenses extend to the etched overcoating layer, and
- wherein the micro lenses are formed using the flow process such that an overflowed substance is not formed on the etched overcoating layer.
2 more elements
Dependencies are inferred from the claim text.