Substrate heat treatment apparatus and substrate transfer tray used in substrate heat treatment
AssigneeCanon Anelva Corporation
InventorsMasami Shibagaki, Yasumi Kurematsu
Life of this patent
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Abstract
A degassing from a susceptor heated at a high temperature in a vacuum atmosphere is suppressed. The susceptor is disposed between a heater and a substrate and partitions a space in the chamber into a first chamber space where the heater is placed and a second chambers space where the substrate is placed, and the surface of the susceptor facing the second chamber space is coated with a pyrolytic carbon layer (15) of thickness of 10 μm to 50 μm.
Claims6
A substrate heat treatment apparatus comprising:
- a treatment chamber, an atmosphere of which can be evacuated, and
- a plate which heats a substrate disposed within the treatment chamber, the temperature of the plate being raised to 800° C. to 2300° C.,
- wherein the treatment chamber has a substrate treatment space where a substrate is placed and the substrate treatment space is evacuated into a pressure equal to or less than 10−2 Pa and the surface of the plate facing the substrate treatment space is coated with a pyrolytic carbon layer of thickness of 10 μm to 50 μm.
A substrate heat treatment apparatus having heating means for heating a susceptor to a high temperature within a treatment chamber that can be evacuated so that a substrate heated by the high temperature susceptor can be processed thermally in the treatment chamber;
- wherein the susceptor is disposed between said heating means and the substrate, the surface of said susceptor facing a space in which the substrate is placed being covered with a pyrolytic carbon layer, and the apparatus further comprises a heat receiving body for capping the substrate placed on said susceptor to seal the space in which the substrate is placed, the surface of the heat receiving body which faces the space being coated with a pyrolytic carbon layer.
Dependencies are inferred from the claim text.