Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor

A plasma processing apparatus, comprising:

• a chamber comprising a wall separating the interior of the chamber into first and second regions, the wall having an opening therein providing fluid communication between the first and second regions;
• a cantilever assembly comprising an arm unit extending horizontally through the opening such that a first end is in the first region and a second end is in the second region, a substrate support being located on an upper portion of the first end and a service conduit being located at the second end;
• an actuation mechanism coupled to an upper portion of the service conduit and operative to move the cantilever assembly in a vertical direction;
• and a dual bellows arrangement providing a balanced atmospheric load on the interior of the chamber, the dual bellows including a first bellows providing a vacuum seal between an upper part of the chamber and the upper portion of the service conduit and a second bellows providing a vacuum seal between a lower part of the chamber and a lower portion of the service conduit.