Chemical vapor deposition of TiN films in a batch reactor

A method of forming a titanium nitride film by chemical vapor deposition, comprising:

• providing a vertical furnace having a reaction chamber, the reaction chamber configured to accommodate 25 or more substrates;
• providing a plurality of substrates in the reaction, chamber;
• chemical vapor depositing the titanium nitride film on the plurality of substrates by performing a plurality of chemical vapor deposition cycles, each cycle performed at a deposition temperature of less than about 500° C. and each cycle comprising:
• exposing the plurality of substrates to a titanium precursor by flowing the titanium precursor into the reaction chamber;
• simultaneously flowing a nitrogen precursor into the reaction chamber while exposing the plurality of substrates to the titanium precursor;
• stopping the flow of the titanium precursor;
• and
• subsequently exposing the plurality of substrates to the nitrogen precursor by flowing the nitrogen precursor into the reaction chamber at an elevated flow rate, wherein the elevated flow rate is higher than a flow rate of the nitrogen precursor during the exposing of the plurality of substrates to the titanium precursor, wherein the titanium nitride film formed by performing the plurality of chemical vapor deposition cycles has a resistivity that varies by less than about 5 μOhm-cm from substrate to substrate within the plurality of substrates.