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US 7,732,192 B2Granted
Integrated chemical microreactor with large area channels and manufacturing process thereof
AssigneeSTMicroelectronics S.r.l.
InventorsGabriele Barlocchi, Ubaldo Mastromatteo, Flavio Francesco Villa
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Abstract
The microreactor has a body of semiconductor material; a large area buried channel extending in the body and having walls; a coating layer of insulating material coating the walls of the channel; a diaphragm extending on top of the body and upwardly closing the channel. The diaphragm is formed by a semiconductor layer completely encircling mask portions of insulating material.
Claims12
An integrated microreactor comprising:
- a) a body of semiconductor material;
- b) a channel in said body and having walls and a coating layer of insulating material coating said walls;
- c) a diaphragm upwardly closing said channel, said diaphragm comprising a semiconductor layer completely encircling mask portions of insulating material, wherein said semiconductor layer is surrounded by an oxide layer;
- d) a structural layer extending on top of said body and said diaphragm;
- e) a reservoir layer extending on top of said structural layer and a first reservoir extending through said reservoir layer as far as said structural layer;
- and
- f) a first aperture extending through said structural layer and connecting said first reservoir with said channel.
4 more elements
Dependencies are inferred from the claim text.