Photosensitive self-assembled monolayer for selective placement of hydrophilic structures

A structure comprising:

• a patterned monolayer located on an oxide surface of a substrate, said patterned monolayer containing a first contiguous region of a first material and a second contiguous region of a second material, wherein said first contiguous region and the second contiguous region laterally abut, and do not overlie, each other, and wherein said first material includes:
• a first end group that forms covalent bonds with said oxide surface;
• a photosensitive group that dissociates upon exposure to ultraviolet radiation linked to said first end group;
• and
• a second end group having hydrophobicity and linked to said photosensitive group, and wherein said first material is a first compound of the structural formula:
• wherein R is one of hydrogen, fully or partially fluorinated alkyl, fully or partially fluorinated alkoxy, or fully or partially fluorinated alkylthio, and wherein a total number of carbon atoms in said alkyl, alkoxy, or said alkylthio is from 1 to 20, and
• wherein said second material includes:
• said first end group;
• and
• a third end group linked to said first end group and having hydrophilicity and derived from said photosensitive group by dissociation of a link by ultraviolet radiation, and wherein said second material is a second compound of the structural formula: