Lithographic apparatus and patterning device

A lithographic apparatus, comprising:

• a projection system;
• a substrate table arranged to hold a substrate;
• and
• a patterning device having a patterned region which bears a pattern to be transferred using a radiation beam via the projection system onto the substrate, the patterned region comprising reflective portions arranged to reflect radiation, and absorptive portions arranged to absorb the radiation, at least part of a border surrounding the patterned region comprising a plurality of reflective elements arranged to direct radiation onto the substrate, the dimensions of the reflective elements being such that, during use, the reflective elements are not resolved at the substrate, wherein the density of the reflective elements is such that, in use, the reflective elements generate flare radiation which substantially compensates for a reduction of flare radiation adjacent to a transverse edge of an exposure slit during use in the lithographic apparatus.