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US 7,710,005 B2Granted
Optical filter of plasma display panel and fabrication method thereof
AssigneeLG Electronics Inc.
InventorsMyeong Soo Chang, Hong Rae Cha, Byung Gil Ryu, Kyung Ku Kim, Young Sung Kim
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Abstract
An optical filter of a plasma display panel (PDP) and its fabrication method are disclosed. The optical filter includes an electromagnetic wave shield layer having a bias angle formed by cutting a mesh film along a predetermined direction.
Claims15
An optical filter of a plasma display panel (PDP) comprising:
- an electromagnetic wave shielding layer formed in a mesh on a base film;
- an anti-reflection layer attached on an upper surface of the electromagnetic wave shielding layer;
- and
- a near infrared ray shielding layer attached on a lower surface of the electromagnetic wave shielding layer, wherein a size of the base film is at least substantially equal to a size of the electromagnetic wave shielding layer, wherein the mesh includes mesh lines in an inner grid that are tilted at an angle determined based on a cut direction of the mesh, and wherein the inner grid is arranged so that the mesh lines have a same predetermined number (N) of intersections overlapping each of a plurality of pixels or sub-pixels of the panel, where N>1.
1 more element
An optical filter of a plasma display panel (PDP) comprising:
- an electromagnetic wave shielding layer formed in a mesh on a base film;
- an anti-reflection layer attached on an upper surface of the electromagnetic wave shielding layer;
- and
- a near infrared ray shielding layer attached on a lower surface of the electromagnetic wave shielding layer;
- wherein the electromagnetic wave shielding layer is formed in the mesh on substantially an entire surface of the base film, wherein the mesh includes mesh lines in an inner grid that are tiled at an angle determined based on a cut direction of the mesh, and wherein the inner grid is arranged so that the mesh lines have a same predetermined number (N) of intersections overlapping each of a plurality of pixels or sub-pixels of the panel, where N>1.
2 more elements
An optical filter of a plasma display panel (PDP) comprising:
- an electromagnetic wave shielding layer formed in a mesh on a base film;
- an anti-reflection layer attached on an upper surface of the electromagnetic wave shielding layer;
- and
- a near infrared ray shielding layer attached on a lower surface of the electromagnetic wave shielding layer, wherein an entire region of one surface of the electromagnetic wave shielding layer is formed only on substantially an entire surface of the base film, wherein the mesh includes mesh lines in an inner grid that are tilted at an angle determined based on a cut direction of the mesh, and wherein the inner grid is arranged so that the mesh lines have a same predetermined number (N) of intersections overlapping each of a plurality of pixels or sub-pixels of the panel, wherein N>1.
1 more element
A method for fabricating an optical filter of a plasma display panel (PDP) comprising:
- forming an electromagnetic wave shielding layer formed in a mesh on a base film;
- attaching an anti-reflection layer on an upper surface of the electromagnetic wave shielding layer;
- and
- attaching a near infrared ray shielding layer on a lower surface of the electromagnetic wave shielding layer, wherein, in forming the electromagnetic wave shielding layer, a size of the base film is at least substantially equal to a size of the electromagnetic wave shielding layer, wherein the mesh includes mesh lines in an inner grid that are titled at an angle determined based on a cut direction of the mesh, and wherein the inner grid is arranged so that the mesh lines have a same predetermined number (N) of intersections overlapping each of a plurality of pixels or sub-pixels of the panel, where N>1.
1 more element
A method for fabricating an optical filter of a plasma display panel (PDP) comprising:
- forming an electromagnetic wave shielding layer formed in a mesh on a base film;
- attaching an anti-reflection layer on an upper surface of the electromagnetic wave shielding layer;
- and
- attaching a near infrared ray shielding layer on a lower surface of the electromagnetic wave shielding layer, wherein, in forming the electromagnetic wave shielding layer, the mesh is formed on substantially an entire surface of the base film, wherein the mesh includes mesh lines in an inner grid that are tilted at an angle determined based on a cut direction of the mesh, and wherein the inner grid is arranged so that the mesh lines have a same predetermined number (N) of intersections overlapping each of a plurality of pixels or sub-pixels of the panel, wherein N>1.
1 more element
A method for fabricating an optical filter of a plasma display panel (PDP) comprising:
- forming an electromagnetic wave shielding layer formed in a mesh on a base film;
- attaching an anti-reflection layer on an upper surface of the electromagnetic wave shielding layer;
- and
- attaching a near infrared ray shielding layer on a lower surface of the electromagnetic wave shielding layer, wherein, in forming the electromagnetic wave shielding layer, an entire region of one surface of the electromagnetic wave shielding layer is formed only on substantially an entire surface of the base film, wherein the mesh includes mesh lines in an inner grid that a tilted at an angle determined based on a cut direction of the mesh, and wherein the inner grid is arranged so that the mesh lines have a same predetermined number (N) of intersections overlapping each of a plurality of pixels or sub-pixels of the panel, wherein N>1.
1 more element
Dependencies are inferred from the claim text.