Multi-level cell resistance random access memory with metal oxides
AssigneeMacronix International Co., Ltd.
InventorsErh-Kun Lai, ChiaHua Ho, Kuang Yeu Hsieh
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AssigneeMacronix International Co., Ltd.
InventorsErh-Kun Lai, ChiaHua Ho, Kuang Yeu Hsieh
Estimating the term…
A bistable resistance random access memory comprises a plurality of programmable resistance random access memory cells where each programmable resistance random access memory cell includes multiple memory members for performing multiple bits for each memory cell. The bistable RRAM includes a first resistance random access member connected to a second resistance random access member through interconnect metal liners and metal oxide strips. The first resistance random access member has a first resistance value Ra, which is determined from the thickness of the first resistance random access member based on the deposition of the first resistance random access member. The second resistance random access member has a second resistance value Rb, which is determined from the thickness of the second resistance random access member based on the deposition of the second resistance random access member.
A resistance random access memory structure, comprising:
A resistance random access memory structure, comprising:
A resistance random access memory structure, comprising a single two-terminal memory cell that includes first and second resistive memory members and first and second interconnects, the first resistive memory member having a first metal oxide strip at a first position and a second metal oxide strip at a second position, the first position spaced apart from the second position, and a first terminal of the cell being connected to the first resistive memory member between the first and second positions, the second resistive memory member having a third metal oxide strip at a third position and a fourth metal oxide strip at a fourth position, the third position spaced apart from the fourth position, and a second terminal of the cell being connected to the second resistive memory member between the third and fourth positions, the first interconnect electrically coupling the first metal oxide strip of the first resistive memory member and the third metal oxide strip of the second resistive memory member, and the second interconnect electrically coupling the second metal oxide strip of the first resistive memory member and the fourth metal oxide strip of the second resistive memory member.
A resistance random access memory structure, comprising:
A resistance random access memory structure, comprising:
Dependencies are inferred from the claim text.