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US 7,696,292 B2Granted
Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
AssigneeCommonwealth Scientific and Industrial Research Organisation
InventorsWilliam Brown Farnham, Michael Fryd, Frank Leonard Schadt, III
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Abstract
The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
Claims5
An acrylic polymer having a polydispersity in the range of 1.05 to 1.3, said polymer consisting essentially of:
- a repeat unit derived from an acrylic monomer selected from the group consisting of acrylate and methacrylate esters,
- wherein at least one of said repeat units has a functional group selected from the group consisting of fluoroalcohol and protected fluoroalcohol groups, wherein the mole percent of said repeat units having the functional groups is from 28.8 to 75.4 mole percent based on the moles of repeat units of said acrylic polymer;
- and
- wherein said polymer has a weight average molecular weight of 14,600 or less from 3,250 to 14,600.
1 more element
Dependencies are inferred from the claim text.