Method and apparatus for evaluating processing apparatus status and predicting processing result
AssigneeTokyo Electron Limited
InventorsShinji Sakano, Satoshi Harada
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsShinji Sakano, Satoshi Harada
Estimating the term…
A method for predicting a processing result includes a process of performing a principal component analysis on a plurality of detected data obtained during a first standard processing, to construct a principal component analysis model; a process of obtaining residuals of the principal component analysis model as first residuals; a process of performing a second standard processing; and a process of obtaining a plurality of detected data from a plurality of detectors during the second standard processing. And, the detected data obtained during the second standard processing are applied to the principal component analysis model, to obtain second residuals. The method further includes a process of weighting the second residuals based on weighting references, and constructing a new multivariate analysis model with use of the weighted second residuals; and a process of predicting a processing result of the second standard processing with use of the multivariate analysis model.
A method for predicting a processing result, comprising:
An apparatus for predicting a processing result, comprising:
Dependencies are inferred from the claim text.