Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology
AssigneeKoninklijke Philips Electronics N.V.
InventorsJeroen Jonkers, Dominik Marcel Vaudrevange
Life of this patent
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Abstract
A method and an apparatus generate radiation in the wavelength range from about 1 nm to about 30 nm by an electrically operated discharge, which can be used in lithography or in metrology. A working gas is provided between two electrodes. Plasma is ignited in the working gas to generate radiation which is forwarded via an opening for further use. Debris particles are produced in at least one region of at least one of the electrodes. To retain the debris particles, the region is arranged with respect to the opening in such a way that movement paths of the debris particles run at least predominantly outside an area delimited by the opening.
Claims26
A method of generating radiation in the wavelength range from about 1 nm to about 30 nm by an electrically operated discharge between electrodes including at least one first electrode and at least one second electrode for forming an opening delimiting an area, the method comprising the acts of:
- igniting at least one working gas provided between the electrodes and a plasma placed in the working gas to generate the radiation and debris particles;
- and
- forwarding the generated radiation via the opening for further use;
- wherein the debris particles are produced in at least one region of at least one of the electrodes, the at least one region being arranged with respect to the opening in such a way that movement paths of the debris particles run at least predominantly outside the area delimited by the opening substantially preventing the debris particles from reaching the opening.
An apparatus for generating radiation in a wavelength range from about 1 nm to about 30 nm by an electrically operated discharge, the apparatus comprising:
- electrodes including a first electrode and a second electrode at a distance, from the first electrode, the first electrode and the second electrode forming an opening delimiting an area;
- at least one working gas provided between the first electrode and the second electrode;
- and
- a plasma located in and capable to be ignited in the working gas to generate radiation and debris particles, at least some of the generated radiation can be forwarded via the opening for further use, and wherein the debris particles are produced in at least one region of at least one electrode of the electrodes;
- wherein the at least one region is arranged with respect to the opening in such a way that movement paths of the debris particles are oriented at least predominantly outside an area delimited by the opening substantially preventing the debris particles from reaching the opening.
Dependencies are inferred from the claim text.