Partial block polyimide-polysiloxane copolymer, making method, and resin composition comprising the copolymer
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHideki Akiba, Nobuhiro Ichiroku, Toshio Shiobara
Life of this patent
Estimating the term…
Abstract
A partial block polyimide-polysiloxane copolymer is provided comprising repeat unit structures having structural formulae (1) and (2) wherein X is an aromatic or aliphatic ring-containing tetravalent organic radical, Y1 is a diamine residue, Y2 is a diaminosiloxane residue, Y1 and Y2 are contained in the copolymer in amounts of 99-20 mol % and 1-80 mol %, respectively, L and m each are an integer of 2-50. The copolymer has good adhesion to substrates, moisture-proof reliability and a low modulus of elasticity.
Claims5
A partial block polyimide-polysiloxane copolymer comprising repeat unit structures having the following structural formulae (2) and (8):
- wherein X is at least one aromatic ring-containing tetravalent organic radical selected from the group consisting of:
- Y2 is a divalent organic radical having the structural formula (3), Y3 is a divalent organic radical having the structural formula (9), Y2 and Y3 are contained in the copolymer in molar amounts y2 and y3, respectively, which satisfy
- y2/(y2+y3)=0.5 to 0.01 and
- y3/(y2+y3)=0.5 to 0.99,
- m is a weight average value of 9.1 to 50, j is a weight average value of 8.8 to 50,
- wherein R1 is a divalent organic radical of 3 to 9 carbon atoms, R2 and R3 are each independently a substituted or unsubstituted, monovalent hydrocarbon radical of 1 to 8 carbon atoms, and n is an integer of 1 to 150,
- wherein A is a radical selected from the following group [9a]:
- group [9a]
- B is a radical selected from the following group [9b]:
- group [9b]
- R is each independently a hydrogen atom, halogen atom or substituted or unsubstituted, monovalent hydrocarbon radical of 1 to 8 carbon atoms, and k is a natural number of 1 to 5.
Dependencies are inferred from the claim text.