Method for fabricating a polysilicon layer having large and uniform grains
AssigneeInnolux Display Corp.
InventorShuo-Ting Yan
Life of this patent
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Abstract
An exemplary method for fabricating a polysilicon layer includes the following steps. A substrate (10) is provided and an amorphous silicon layer (12) is formed over the substrate. An excimer laser generator (13) for generating a pulse excimer laser beams collectively having the shape of a generally rectangular shaft is provided to melt a first area (15) of the amorphous silicon layer with the pulse excimer laser beams. The excimer laser generator is moved a distance to melt a second area of the amorphous layer spaced a short distance away from the first area. At least a subsequent third melted area spaced a short distance away from the second melted area is formed, with each subsequent melted area is spaced as short distance away from the immediately preceding melted area.
Claims17
A method for fabricating a polysilicon layer, the method comprising:
- providing a substrate, and forming an amorphous silicon layer over the substrate;
- providing an excimer laser generator for generating pulse excimer laser beams collectively having the shape of a generally rectangular shaft, and melting a first area of the amorphous silicon layer with the pulse excimer laser beams;
- moving the excimer laser generator a distance to melt a second area of the amorphous silicon layer, the second melted area spaced a short distance away from the first melted area of the amorphous silicon layer;
- and
- forming at least a subsequent third melted area spaced a short distance away from the second melted area, with each such subsequent melted area being spaced a short distance away from the immediately preceding melted area, wherein each subsequent melted area and the immediately preceding melted area are separated by an unmelted interval area.
A method for fabricating a polysilicon layer, the method comprising:
- providing a substrate, and forming an amorphous silicon layer on the substrate;
- providing a laser generator for generating pulse laser beams;
- and
- successively moving the laser generator along a single linear path and melting in succession a plurality of strip areas of the amorphous silicon layer;
- wherein the strip areas are parallel to each other, and each two adjacent strip areas are separated by a respective unmelted interval area.
Dependencies are inferred from the claim text.