Method and device for producing layout patterns of a semiconductor device having an even wafer surface
AssigneeNEC Electronics Corporation
InventorsHidekazu Kawashima, Tetsuya Katoh
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Abstract
Primitive cells, which are circuit patterns of the constituent elements of a semiconductor device, are arranged in the element formation area of a semiconductor device, and at least one fill cell with a diffusion layer and no wiring, is arranged in the vacant areas that are generated in the element formation area after the primitive cells have been arranged.
Claims5
A method of fabricating a semiconductor device in which diffusion layers and trenches for isolating elements are formed on a wafer, following which an insulating film is formed over the entire surface of said wafer including the interior of said trenches, and said insulating film is ground to planarize the surface of said wafer, said method comprising:
- forming primitive cells having circuit patterns of constituent elements of said semiconductor device in the element formation area of said semiconductor device;
- and
- forming at least one fill cell with a diffusion layer and no wiring, in a vacant area that is to be generated forming said primitive cells.
Dependencies are inferred from the claim text.